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dc.contributor.authorŽurauskienė, Nerija
dc.contributor.authorPavilonis, Dainius
dc.contributor.authorBalevičius, Saulius
dc.contributor.authorStankevič, Voitech
dc.contributor.authorManeikis, Andrius
dc.contributor.authorPlaušinaitienė, Valentina
dc.contributor.authorNovickij, Jurij
dc.date.accessioned2023-09-18T16:16:48Z
dc.date.available2023-09-18T16:16:48Z
dc.date.issued2015
dc.identifier.issn0093-3813
dc.identifier.other(BIS)LBT02-000055504
dc.identifier.urihttps://etalpykla.vilniustech.lt/handle/123456789/112625
dc.description.abstractThe results of fast resistance relaxation of nanostructured La1-xCaxMnO3 (LCMO) films with different compositions x (0.218, 0.285, 0.296, 0.41) grown by the metal-organic chemical vapor deposition technique are presented. The fast (~200μs) resistance relaxation process observed after the magnetic field pulse was switched off was studied in pulsed fields up to 14 T in the temperature range of 80-170 K. It was found that the remnant resistivity of the fast relaxation process is proportional to the magnetoresistance of the films up to 10 T. The smallest remnant relaxation values were found for the films with highest insulator-metal transition temperature Tm. It was shown that the fast process could be analyzed using the Kolmogorov-Avrami-Fatuzzo model, taking into account the reorientation of magnetic domains into their equilibrium state. It was concluded that LCMO films with x=0.218 should be favored for the development of fast pulsed magnetic field sensors operating at cryogenic temperatures.eng
dc.formatPDF
dc.format.extentp. 3445-3450
dc.format.mediumtekstas / txt
dc.language.isoeng
dc.relation.isreferencedbyIEEE Xplore
dc.relation.isreferencedbyScience Citation Index Expanded (Web of Science)
dc.subjectMC02 - Elektros ir elektroniniai įrenginiai bei sistemos / Electrical and electronic devices and systems
dc.titleFast resistance relaxation in nanostructured La-Ca-Mn-O films in pulsed magnetic fields
dc.typeStraipsnis Web of Science DB / Article in Web of Science DB
dcterms.references32
dc.type.pubtypeS1 - Straipsnis Web of Science DB / Web of Science DB article
dc.contributor.institutionValstybinis mokslinių tyrimų institutas Fizinių ir technologijos mokslų centras
dc.contributor.institutionVilniaus Gedimino technikos universitetas
dc.contributor.facultyElektronikos fakultetas / Faculty of Electronics
dc.subject.researchfieldT 001 - Elektros ir elektronikos inžinerija / Electrical and electronic engineering
dc.subject.researchfieldN 002 - Fizika / Physics
dc.subject.ltspecializationsL104 - Nauji gamybos procesai, medžiagos ir technologijos / New production processes, materials and technologies
dc.subject.enColossal magnetoresistance (CMR)
dc.subject.enMagnetic field sensors
dc.subject.enManganites
dc.subject.enResistance relaxation processes
dc.subject.enThin films
dcterms.sourcetitleIEEE transactions on plasma science
dc.description.issueno. 10
dc.description.volumeVol. 43
dc.publisher.nameIEEE
dc.identifier.doi10.1109/TPS.2015.2424162
dc.identifier.elaba11885364


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