Growth of magnetron‐sputtered ultrathin chromium films: In situ monitoring and ex situ film properties

Abstract

We report a systematic nanoscale investigation on the ultrathin Cr film growth process and properties. Polycrystalline metallic films were manufactured by magnetron sputtering on fused silica substrates. The film growth was observed in situ by broad-band optical monitoring (BBM) and plasma-emission spectroscopy (OES) methods. The ex situ characterization of the Cr films with thicknesses varying from 2.6 nm up to 57 nm were performed by both non-destructive and destructive techniques. Recently, we reported on a novel set of data for optical and electrical properties of sputtered chromium films. The optical and electrical properties of the films are known to be governed by their structure and microstructure, which were analyzed in detail in the present research. Moreover, the optical properties of the films were studied here in a significantly wider optical range and obtained using both in situ and ex situ measurements. Reliable in situ nanoscale characterization of metal films was shown to ensure an unfailing approach in obtaining ultrathin layers with desirable thickness and stable and well-determined optical constants and electrical conductivity. This is of high importance for various industries and novel upcoming applications.