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dc.contributor.authorPalenskis, Vilius
dc.contributor.authorŽitkevičius, Evaras
dc.date.accessioned2023-09-18T17:21:09Z
dc.date.available2023-09-18T17:21:09Z
dc.date.issued2018
dc.identifier.issn2160-6919
dc.identifier.urihttps://etalpykla.vilniustech.lt/handle/123456789/122111
dc.description.abstractIt is shown that the linear resistivity dependence on temperature for metals above the Debye’s temperature mainly is caused by electron-electron scattering of randomly moving electrons. The electron mean free path in metals at this temperature range is in inverse proportion to the effective density of randomly moving electrons, i.e. it is in inverse proportion both to the temperature, and to the density-of-states at the Fermi surface. The general relationships for estimation of the average diffusion coefficient, the average velocity, mean free length and average relaxation time of randomly moving electrons at the Fermi surface at temperatures above the Debye’s temperature are presented. The effective electron scattering cross-sections for different metals also are estimated. The calculation results of resistivity dependence on temperature in the range of temperature from 1 K to 900 K for Au, Cu, Mo, and Al also are presented and compared with the experimental data. Additionally in temperature range from 1 K to 900 K for copper, the temperature dependences of the mean free path, average diffusion coefficient, average drift mobility, average Hall mobility, average relaxation time of randomly moving electrons, and their resultant phonon mediated scattering cross-section are presented.eng
dc.formatPDF
dc.format.extentp. 115-129
dc.format.mediumtekstas / txt
dc.language.isoeng
dc.relation.isreferencedbyScilit
dc.relation.isreferencedbyCNKI Scholar (nenaudotinas)
dc.relation.isreferencedbyGenamics Journal Seek
dc.relation.isreferencedbyAcademic Journals Database
dc.relation.isreferencedbyOpen J-Gate
dc.rightsLaisvai prieinamas internete
dc.source.urihttp://www.scirp.org/journal/PaperInformation.aspx?PaperID=86889
dc.source.urihttps://talpykla.elaba.lt/elaba-fedora/objects/elaba:30485667/datastreams/MAIN/content
dc.titlePhonon mediated electron-electron scattering in metals
dc.typeStraipsnis kitoje DB / Article in other DB
dcterms.accessRightsThis work is licensed under the Creative Commons Attribution-NonCommercial International License (CC BY-NC 4.0). http://creativecommons.org/licenses/by-nc/4.0/
dcterms.references18
dc.type.pubtypeS3 - Straipsnis kitoje DB / Article in other DB
dc.contributor.institutionVilniaus universitetas
dc.contributor.institutionVilniaus Gedimino technikos universitetas
dc.contributor.facultyElektronikos fakultetas / Faculty of Electronics
dc.subject.researchfieldN 002 - Fizika / Physics
dc.subject.vgtuprioritizedfieldsFM0101 - Fizinių, technologinių ir ekonominių procesų matematiniai modeliai / Mathematical models of physical, technological and economic processes
dc.subject.ltspecializationsL104 - Nauji gamybos procesai, medžiagos ir technologijos / New production processes, materials and technologies
dc.subject.eneffective density of randomly moving electrons
dc.subject.enelectron-electron scattering
dc.subject.enelectron diffusion coefficient
dc.subject.enelectron mean free path
dc.subject.enscattering cross-section
dcterms.sourcetitleWorld journal of condensed matter physics
dc.description.issueno. 3
dc.description.volumevol. 8
dc.publisher.nameScientific Research Publishing Inc
dc.publisher.cityWuhan
dc.identifier.doi10.4236/wjcmp.2018.83008
dc.identifier.elaba30485667


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