Rodyti trumpą aprašą

dc.contributor.authorMetlevskis, Edvardas
dc.contributor.authorMartavičius, Romanas
dc.date.accessioned2023-09-18T20:03:57Z
dc.date.available2023-09-18T20:03:57Z
dc.date.issued2014
dc.identifier.issn1392-1215
dc.identifier.other(BIS)VGT02-000028233
dc.identifier.urihttps://etalpykla.vilniustech.lt/handle/123456789/146431
dc.description.abstractA method for determination of input impedance of meander slow - wave system with additional shields is presented. It is based on a technique used for a calculation of frequency characteristics of helical slow - wave systems. The input impedance was determined at two ports: on the edge and in the centre of a system. S11 parameter is known as the input reflection coefficient, so system‘s input impedance in the lower frequencies can be determined by changing the signal source and load resistances until minimum value of S11 parameter is obtained. Using proposed method frequency characteristics of input impedance and S11 parameter of a meander slow - wave system with additional shields is analysed in Sonnet software.eng
dc.formatPDF
dc.format.extentp. 59-62
dc.format.mediumtekstas / txt
dc.language.isoeng
dc.relation.isreferencedbyScience Citation Index Expanded (Web of Science)
dc.relation.isreferencedbyINSPEC
dc.relation.isreferencedbyVINITI
dc.source.urihttp://dx.doi.org/10.5755/j01.eee.20.3.6678
dc.subjectMC02 - Elektros ir elektroniniai įrenginiai bei sistemos / Electrical and electronic devices and systems
dc.titleFrequency characteristics of the input impedance of meander slow - wave system with additional shields
dc.typeStraipsnis Web of Science DB / Article in Web of Science DB
dcterms.references19
dc.type.pubtypeS1 - Straipsnis Web of Science DB / Web of Science DB article
dc.contributor.institutionVilniaus Gedimino technikos universitetas
dc.contributor.facultyElektronikos fakultetas / Faculty of Electronics
dc.subject.researchfieldT 001 - Elektros ir elektronikos inžinerija / Electrical and electronic engineering
dc.subject.ltspecializationsL104 - Nauji gamybos procesai, medžiagos ir technologijos / New production processes, materials and technologies
dc.subject.enMicrowave integrated circuits
dc.subject.enScattering parameters
dc.subject.enImpedance matching
dcterms.sourcetitleElektronika ir elektrotechnika
dc.description.issueno. 3
dc.description.volumeVol. 20
dc.publisher.nameKTU
dc.publisher.cityKaunas
dc.identifier.doi000333396800011
dc.identifier.doi10.5755/j01.eee.20.3.6678
dc.identifier.elaba4069452


Šio įrašo failai

FailaiDydisFormatasPeržiūra

Su šiuo įrašu susijusių failų nėra.

Šis įrašas yra šioje (-se) kolekcijoje (-ose)

Rodyti trumpą aprašą