dc.contributor.author | Navickas, Romualdas | |
dc.date.accessioned | 2023-09-18T18:52:59Z | |
dc.date.available | 2023-09-18T18:52:59Z | |
dc.date.issued | 2002 | |
dc.identifier.issn | 1811-4512 | |
dc.identifier.other | (BIS)VGT02-000005061 | |
dc.identifier.uri | https://etalpykla.vilniustech.lt/handle/123456789/132666 | |
dc.description.abstract | The model of the evolution masks in the process underetching layers is created by PC with MATLAB 5.3 for analysis and design new technologies semiconductors devices, integrated circuits and biomedical and others microsystems. The results are achieving for differents iniatial data (rates of etching masks and underetching layers, geometry of the masks etc.). | eng |
dc.format.extent | p. 52-55 | |
dc.format.medium | tekstas / txt | |
dc.language.iso | rus | |
dc.title | Моделирование изменения масок в процессах поперечного травления | |
dc.type | Straipsnis kitame recenzuotame leidinyje / Article in other peer-reviewed source | |
dc.type.pubtype | S4 - Straipsnis kitame recenzuotame leidinyje / Article in other peer-reviewed publication | |
dc.contributor.institution | Vilniaus Gedimino technikos universitetas | |
dc.contributor.faculty | Elektronikos fakultetas / Faculty of Electronics | |
dc.subject.researchfield | T 001 - Elektros ir elektronikos inžinerija / Electrical and electronic engineering | |
dcterms.sourcetitle | Электроника и связь : научно-технический журнал | |
dc.description.issue | № 17 | |
dc.publisher.name | КПI | |
dc.publisher.city | Киев | |
dc.identifier.elaba | 3619819 | |