Моделирование изменения масок в процессах поперечного травления
Santrauka
The model of the evolution masks in the process underetching layers is created by PC with MATLAB 5.3 for analysis and design new technologies semiconductors devices, integrated circuits and biomedical and others microsystems. The results are achieving for differents iniatial data (rates of etching masks and underetching layers, geometry of the masks etc.).