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dc.contributor.authorNavickas, Romualdas
dc.date.accessioned2023-09-18T18:52:59Z
dc.date.available2023-09-18T18:52:59Z
dc.date.issued2002
dc.identifier.issn1811-4512
dc.identifier.other(BIS)VGT02-000005061
dc.identifier.urihttps://etalpykla.vilniustech.lt/handle/123456789/132666
dc.description.abstractThe model of the evolution masks in the process underetching layers is created by PC with MATLAB 5.3 for analysis and design new technologies semiconductors devices, integrated circuits and biomedical and others microsystems. The results are achieving for differents iniatial data (rates of etching masks and underetching layers, geometry of the masks etc.).eng
dc.format.extentp. 52-55
dc.format.mediumtekstas / txt
dc.language.isorus
dc.titleМоделирование изменения масок в процессах поперечного травления
dc.typeStraipsnis kitame recenzuotame leidinyje / Article in other peer-reviewed source
dc.type.pubtypeS4 - Straipsnis kitame recenzuotame leidinyje / Article in other peer-reviewed publication
dc.contributor.institutionVilniaus Gedimino technikos universitetas
dc.contributor.facultyElektronikos fakultetas / Faculty of Electronics
dc.subject.researchfieldT 001 - Elektros ir elektronikos inžinerija / Electrical and electronic engineering
dcterms.sourcetitleЭлектроника и связь : научно-технический журнал
dc.description.issue№ 17
dc.publisher.nameКПI
dc.publisher.cityКиев
dc.identifier.elaba3619819


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