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dc.contributor.authorNavickas, Romualdas
dc.date.accessioned2023-09-18T20:03:59Z
dc.date.available2023-09-18T20:03:59Z
dc.date.issued2013
dc.identifier.other(BIS)VGT02-000028242
dc.identifier.urihttps://etalpykla.vilniustech.lt/handle/123456789/146439
dc.description.abstractThis paper presents the analysis of self-formation processes of micro and nanostructures in technologies of manufacturing high-speed semiconductor devices and integrated circuits (ICs) according possibilities to receive the minimal width of the base area and the methods used for the formation of contacts and electrodes. The results of the implementation of self-formation processes for creating new technologies of manufacturing semiconductor devices and ICs have been presented.eng
dc.formatPDF
dc.format.extentp. 1-8
dc.format.mediumtekstas / txt
dc.language.isoeng
dc.relation.isreferencedbyConference Proceedings Citation Index - Science (Web of Science)
dc.relation.isreferencedbyIEEE Xplore
dc.source.urihttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=6701997&sortType%3Dasc_p_Sequence%26filter%3DAND%28p_IS_Number%3A6701993%29
dc.subjectMC02 - Elektros ir elektroniniai įrenginiai bei sistemos / Electrical and electronic devices and systems
dc.titleSelf-formation processes in high-speed integrated circuits
dc.typeStraipsnis konferencijos darbų leidinyje Web of Science DB / Paper in conference publication in Web of Science DB
dcterms.references16
dc.type.pubtypeP1a - Straipsnis konferencijos darbų leidinyje Web of Science DB / Article in conference proceedings Web of Science DB
dc.contributor.institutionVilniaus Gedimino technikos universitetas
dc.contributor.facultyElektronikos fakultetas / Faculty of Electronics
dc.subject.researchfieldT 001 - Elektros ir elektronikos inžinerija / Electrical and electronic engineering
dc.subject.ltspecializationsL106 - Transportas, logistika ir informacinės ir ryšių technologijos (IRT) / Transport, logistic and information and communication technologies
dc.subject.enSelf-formation processes
dc.subject.enIntegrated circuits (ICs)
dc.subject.enNon-lithography methods
dcterms.sourcetitleNORCHIP 2013: Vilnius, Lithuania, 11-12 Nov. 2013
dc.publisher.nameIEEE
dc.publisher.cityNew York
dc.identifier.doi000345902700001
dc.identifier.doi10.1109/NORCHIP.2013.6701997
dc.identifier.elaba4070008


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